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Product laser

Products
Wafer Level TGV Laser Micro-Drilling System
Product Introduction
This system utilizes a precise motion control platform combined with advanced laser modification technology to perform high-density micro-hole and micro-trench processing on various glass substrates. This is a crucial manufacturing step before metallization processes for semiconductors and display packaging applications.
Product Features

Excellent material compatibility supports quartz, borosilicate, soda-lime, aluminosilicate, and other specialty glass types

Flexible patterning capabilities enable fabrication of round holes, square holes, blind vias, through vias, and micro-grooves as required

Outstanding deep-hole processing with aspect ratio up to 1:100, minimum hole diameter ≤ 5 μm

Good hole quality with smooth inner-side walls that are free of cracks and burs

High throughput and capacity optimized for large-scale production

Precise positioning and repeatability for micro-level accuracy


Field of application
Glass-based chip packaging, display chip encapsulation, etc.
Technical indicators
Specification
Details
Substrate Size
4 to 12-inch round or square wafers
Loading Method
Automated cassette feed (basket-type) for 4 to 12-inch wafers
Processing Type
Fixed-beam laser + high-precision motion platform
Platform Speed
≤ 1000 mm/s
Hole Shapes
Circular, square, blind via, through via, micro-trench
Minimum Hole Diameter
5 μm
Maximum Aspect Ratio
1:100
Platform Accuracy
Repeatability ≤ ±1 μm; Positioning accuracy < ±2 μm
Pattern Placement Accuracy
≤ ±3 μm within a 300 mm processing range
Throughput
≥ 5000 points per second

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